将两种不同微观组织的钼靶材在同样的溅射工艺下进行薄膜溅射，通过溅射后钼靶材和钼溅射薄膜的表面形貌观察以及钼薄膜厚度、方阻及结晶取向的测试，探讨了靶材微观组织对薄膜性能的影响。结果表明，靶材的微观组织对钼薄膜的性能有着较大的影响，晶粒组织细小均匀的钼靶材有助于钼薄膜沉积速率的提高，同时有利于组织均匀、表面平整以及厚度和方阻分布均匀的钼薄膜的形成；两种钼靶材溅射形成的钼薄膜均呈现明显的(110)择优取向，钼靶材微观组织的差异对溅射薄膜的结晶取向没有显著的影响。

Two molybdenum target materials with different microstructures were sputtered under the same sputtering process, and the surface morphology of the molybdenum target and molybdenum sputtered film was observed after sputtering, and the thickness, square resistance and crystal orientation of the molybdenum film were observed. The test explored the influence of the target's microstructure on the film properties. The results show that the microstructure of the target material has a great influence on the performance of the molybdenum film. A molybdenum target with a fine and uniform grain structure contributes to the increase of the deposition rate of the molybdenum film. The formation of molybdenum films with uniform resistance distribution; the molybdenum films formed by the sputtering of the two molybdenum target materials show obvious (110) preferred orientation, and the difference in the microstructure of the molybdenum target materials has no significant effect on the crystalline orientation of the sputtered film.