本发明公开了一种钼钨溅射靶材及其制备方法,其相对密度为99.0-99.5％,氧含量为350-600ppm,原料由纯度≥4N的三氧化钨粉和纯度≥3N的钼粉组成,且三氧化钨粉的含量为15-20wt％,余量为钼粉,该三氧化钨粉的粒径为7-10μm,该钼粉的粒径为4.5-6.5μm。本发明适用于制备平面显示器,组织均匀,无孔洞,且氧含量低。

The invention discloses a molybdenum-tungsten sputtering target material and a preparation method thereof. The relative density is 99.0-99.5%, the oxygen content is 350-600ppm, and the raw materials are tungsten trioxide powder with a purity of ≥4N and molybdenum powder with a purity of ≥3N. And the content of tungsten trioxide powder is 15-20wt%, the balance is molybdenum powder, the particle size of the tungsten trioxide powder is 7-10μm, and the particle size of the molybdenum powder is 4.5-6.5μm. The invention is suitable for preparing flat-panel displays, has uniform organization, no holes, and low oxygen content.