铝合金具有比重小、耐腐蚀、耐磨、强度高、导热性好以及便于回收再利用等优点，在汽车、飞机、坦克及船用发动机等领域广泛应用。然而，由于铝合金在切削过程中，切屑极易粘刀，导致切削热急剧增加，严重影响了加工的继续进行。随着大量的复合材料，如玻纤，硅等成分加入，更加剧了铝合金高效、高精度的加工难度。印制线路板是电子行业的重要部件，其由金属，合成树脂，陶瓷和玻纤等复合 材料制成，具有高脆性，高硬度，低导热性能等特点，在加工转速达到15-18万转/min环境下，产生大量切削热，导致钻针失效。因此，解决复合铝合金加工刀具的粘刀问题以及印刷线路板的钻针失效问题，将为我国节省大量的自然资源以及大幅提高生产效益，具有重要的理论和实际意义。由于四面体非晶碳膜层中sp³杂化键占比超过50%，具有高硬度、高弹性模量、润滑性好、电阻率高以及良好的化学惰性等优点，且非晶碳膜层沉积温度较低，在室温下即可沉积在不同种类的基体。基于此，本项目拟通过带有反向正脉冲的高功率脉冲磁控溅射技术，开发高硬度无氢四面体非晶碳涂层，旨在解决上述材料加工 过程的粘刀/粘针问题。制备高硬度无氢四面体非晶碳膜，其技术难点在于如何解决沉积过程靶材中毒问题？如何提高靶材离化率问题？如何提高碳膜sp³杂化键含量问题？如何提高膜层沉积速率问题？如何控制沉积膜层内应力，以及膜层结合力和表面粗糙度问题？解决这些问题首先是突破高电流密度的转化以及功率密度区间的控制瓶颈，本项目拟通过带有反向正脉冲的HiPIMS电源技术实现。其次，通过放电电离机制调控、等离子体成分、放电周期粒子传输路径以及放电粒子能量分布控制等因素，大幅提高涂层沉积速率；同时，结合合理的材料结构设计，利用多金属耦合作用改善沉积制备涂层的性能，如涂层硬度，致密性和膜基结合力等。在优化电磁场分布的基础上，进而实现工业化高效生产高硬度无氢四面体非晶碳膜。项目团队中国方包括东北大学、上海新弧源涂层技术有限公司，西班牙方包括INGENIERÍA VIESCA SL、NANO4ENERGY SLNE。东北大学项目团队不仅具有丰富的薄膜理论基础和薄膜性能分析能力，而且在电源技术、制备技术等方面也有较强的基础，可结合建模分析能力和实验室检测技术，为该项目提供产品设计、材料性能优化方案等相关技术理论和实践指导。上海新弧源涂层技术有限公司作为涂层生产企业，其生产实践为本项目提供硬件支持以及量产化验证，分析与调控市场用户应用情况。西班牙IV公司为西班牙最大的非标工业电源等电子元器件供应商，包括电气元器件的工程设计，生产和整套技术解决方案。在HiPIMS的电源技术HiPLUS方面具有技术经验，包括HiPLUS电源技术的设计、生产、检测等。N4E公司在PVD（物理气相沉积）技术制备纳米复合新型薄膜材料具有丰富的涂层制备经验，可以在其自有的研发型设备上初步提供性能开发和验证。项目团队优势互补，合作基础强。目前，HiPLUS技术的基础验证工作已经在西班牙的研发型设备上成功完成。此合作目的是将此技术推向工业化量产使用。东北大学团队在金属表面膜沉积机理、内应力控制、性能优化等相关研究方面已取得突破，将根据其薄膜理论基础建立数学模型，分析沉积速率，涂层硬度和涂层中sp³键含量的关系；确定关键参数、性能指标，以及最佳涂层工艺。上海新弧源涂层技术有限公司拥有高性能涂层设备，安装上述HiPLUS 技术的硬件，结合工艺模型可验证所制备的ta-C涂层性能，结合用户试验，固化制备工艺，最终实现在量产型涂层设备稳定批量生产。

Aluminum alloy has advantages such as low density, corrosion resistance, wear resistance, high strength, good thermal conductivity, and easy recycling and reuse. It is widely used in fields such as automobiles, airplanes, tanks, and marine engines. However, due to the tendency of chips to stick to the tool during the cutting process of aluminum alloy, the cutting heat increases sharply, seriously affecting the continuation of machining. With the addition of a large number of composite materials such as fiberglass and silicon, the difficulty of efficient and high-precision processing of aluminum alloys has been further intensified. Printed circuit boards are important components in the electronics industry, made of composite materials such as metals, synthetic resins, ceramics, and fiberglass. They have high brittleness, high hardness, and low thermal conductivity. When the processing speed reaches 150000 to 180000 revolutions per minute, a large amount of cutting heat is generated, leading to the failure of drill needles. Therefore, solving the problem of tool sticking in composite aluminum alloy machining and the failure of drilling needles in printed circuit boards will save a lot of natural resources and greatly improve production efficiency in China, which has important theoretical and practical significance. Due to the fact that the proportion of sp³ bonds in the tetrahedral amorphous carbon film layer exceeds 50%, it has advantages such as high hardness, high elastic modulus, good lubrication, high electrical resistivity, and good chemical inertness. In addition, the deposition temperature of the amorphous carbon film layer is relatively low, and it can be deposited on different types of substrates at room temperature. Based on this, this project plans to develop a high hardness hydrogen free tetrahedral amorphous carbon coating using high-power pulsed magnetron sputtering technology with reverse positive pulses, aiming to solve the problem of tool/needle sticking during the material processing mentioned above. The technical difficulty in preparing high hardness hydrogen free tetrahedral amorphous carbon films lies in how to solve the problem of target material poisoning during the deposition process. How to improve the ionization rate of target materials? How to increase the content of sp³ hybrid bonds in carbon films? How to improve the deposition rate of the membrane layer? How to control the internal stress, adhesion, and surface roughness of the deposited film layer? To solve these problems, the first step is to break through the bottleneck of high current density conversion and power density range control. This project aims to achieve it through HiPIMS power supply technology with reverse positive pulses. Secondly, by controlling factors such as discharge ionization mechanism, plasma composition, particle transport path during discharge cycle, and energy distribution of discharge particles, the deposition rate of coatings can be significantly improved; At the same time, combined with reasonable material structure design, utilizing the coupling effect of multiple metals to improve the performance of deposited coatings, such as coating hardness, density, and film-based bonding force. On the basis of optimizing the distribution of electromagnetic fields, industrial and efficient production of high hardness and hydrogen free tetrahedral amorphous carbon films can be achieved. The project team in China includes Northeastern University and Shanghai New Arc Source Coating Technology Co., Ltd., while the Spanish team includes INGENIER Í A VIESCA SL and NANO4ENERGY SLNE. The project team of Northeastern University not only has a rich theoretical foundation in thin films and analysis capabilities in thin film performance, but also has a strong foundation in power supply technology, preparation technology, and other aspects. They can combine modeling and analysis capabilities with laboratory testing techniques to provide relevant technical theory and practical guidance for product design, material performance optimization solutions, and other related technologies for the project. Shanghai New Arc Source Coating Technology Co., Ltd., as a coating production enterprise, provides hardware support and mass production verification for this project through its production practice, and analyzes and regulates the market user application situation. Spanish company IV is the largest supplier of electronic components for non-standard industrial power supplies in Spain, including engineering design, production, and complete technical solutions for electrical components. I have technical experience in HiPLUS power technology for HiPIMS, including the design, production, and testing of HiPLUS power technology. N4E Company has rich experience in coating preparation of nanocomposite new thin film materials using PVD (Physical Vapor Deposition) technology, which can provide preliminary performance development and verification on its own research and development equipment. The project team has complementary advantages and a strong foundation for cooperation. At present, the basic verification work of HiPLUS technology has been successfully completed on research and development equipment in Spain. The purpose of this cooperation is to push this technology towards industrial mass production. The team of Northeastern University has made breakthroughs in the research on the deposition mechanism, internal stress control, performance optimization and other related aspects of metal surface facial mask, which will establish a mathematical model based on its film theoretical basis to analyze the relationship between deposition rate, coating hardness and the content of sp³ bond in the coating; Determine key parameters, performance indicators, and optimal coating process. Shanghai New Arc Source Coating Technology Co., Ltd. has high-performance coating equipment, which installs the hardware of the HiPLUS technology mentioned above. Combined with process models, the performance of the prepared ta-C coating can be verified. Through user experiments and curing preparation processes, stable mass production can be achieved in mass production coating equipment.