本发明公开了一种四面体非晶碳膜ta‑C涂 层的制备方法，包括以下步骤：S1、将基体抛光处理，超声清洗后进行离子轰击；S2、再停留在Cr靶 前，通过高功率脉冲反应溅射获得CrN底层；S3、再停留在Cr靶前，通过功率为5‑10kW的脉冲反应溅射获得CrC过渡层；S4、通入氩气和氮气，使用电弧离子镀引燃靶材；S5、再停留在石墨靶前，通过功率3.5‑6.0kw的脉冲多靶磁控溅射获得ta‑C涂层。本发明制备ta‑C涂层硬度达到32Gpa以上，具有低于0.085的摩擦系数，有较好的润滑性能，本发明方法能有效提高高功率脉冲磁控溅射沉积速率，提高涂层硬度和降低粗糙度，拓宽了此涂层技术和此涂层的研究范围。

The present invention discloses a preparation method for a tetrahedral amorphous carbon film ta C coating, comprising the following steps: S1, polishing the substrate, ultrasonic cleaning, and ion bombardment; S2, stay in front of the Cr target again and obtain the bottom layer of CrN through high power pulse reactive sputtering; S3. Stay in front of the Cr target again and obtain the CrC transition layer through pulsed reactive sputtering with a power of 510kW; S4, inject argon and nitrogen gas and ignite the target material using arc ion plating; S5, staying in front of the graphite target, Ta-C coating was obtained by pulsed multi target magnetron sputtering with a power of 3.5 6.0kw. The Ta-C coating prepared by the present invention has a hardness of over 32Gpa, a friction coefficient below 0.085, and good lubrication performance. The method of the present invention can effectively improve the deposition rate of high-power pulse magnetron sputtering, improve the coating hardness and reduce roughness, and broaden the research scope of this coating technology and this coating.